Design and Technology Bureau

Brief historical background about the unit

The bureau was created in 1998 as a laboratory within the Department of the Republican Engineering and Technical Center for Restoration and Strengthening of Machine Parts and Mechanisms at the Institute of Physics and Mathematics of the Siberian Branch of the Russian Academy of Sciences. The main direction of the bureau is the development of ion-plasma equipment and devices for applying protective, decorative and wear-resistant coatings.

Areas of research

Development of equipment for applying multifunctional gradient nanostructured coatings using magnetron and arc sputtering methods, ion-plasma processing, and micro-arc oxidation. Development of methods for ion-beam hardening of the surface of a cutting tool. Development of magnetron sputtering devices, arc sputtering sources and ion sources to assist in the deposition of coatings and ion implantation of coatings and surfaces of products for various purposes.

Composition of the unit
Total number 3 people

List of staff members

Kuzmin Oleg Stanislavovich, leading designer, OSTK@mail2000.ru .
Andrey Vladimirovich Pokushalov, leading technologist
Yuri Nikolaevich Paraev, leading engineer, yuparaev@gmail.com

The most important scientific results

1. The scientific basis for the creation of ceramic composites with a hierarchical internal structure for modern branches of technology has been developed.
2. Methods for producing chemicals and creating new materials have been developed.
3. A physicochemical model has been developed for the initial stages of the formation of a barrier layer and the occurrence of microplasma processes under high-energy exposure to the interface between two liquid phases and the electrode-electrolyte.
4. Equipment for the automated application of oxide low-emissivity nano-sized coatings using the ion-magnetron deposition of materials in a vacuum has been developed.
5. A set of equipment has been developed for applying multifunctional nanostructured coatings, including magnetron sputtering, low- and high-energy ion exposure, and high temperature.
6. A complex of equipment for automated hardening of cutting tools and machine parts using the method of ion implantation of multicomponent high-energy ions has been developed.

The most important publications
1. Dorofeeva T.I., Mamaev A.I., Mamaeva V.A. Relationship between cyclic current-voltage characteristics and properties of oxide-ceramic coatings over time during microplasma oxidation of the surface of aluminum alloys // Perspective materials.-2007. - No. 6. - c. 70-73.
2. Dorofeeva T.I., Mamaev A.I., Mamaeva V.A., Butyagin P.I. Microplasma formation of oxide-ceramic coatings in a vacuum. Physics and chemistry of materials processing 2007, No. 3, p. 17-21.
3. Mamaev A.I., Dorofeeva T.I., Borikov V.N., Mamaeva V.A. Modeling of the initial stages of coating formation on valve metals under high-voltage, high-current pulsed action // Physics and chemistry of materials processing. - 2007, - No. 3, - p. 35-43.
4. Mamaev A.I., Dorofeeva T.I., Mamaeva V.A., Borikov V.N. Adhesion and plasticity of coatings obtained by microplasma oxidation of titanium // Metal technology. - 2008. - No. 3. - With. 33-37.
5. Sergeev V.P., Yanovsky V.P., Paraev Yu.N., Sergeev O.V., Kozlov D.V., Zhuravlev S.A.. Installation of ion-magnetron sputtering of nanocrystalline coatings ( QUANTUM). Physical mesomechanics, 2004, vol. 7, Special issue, part 2, p. 333-336.
6. Yanovsky V.P., Kuzmin O.S., Sergeev V.P., Kositsyn L.G., Padusenko A.N. Magnetron sputtering of low-emission coatings. // Physical mesomechanics, 2006, T.9, Special issue, p. 189-192.

Patents, inventions
1. RF Patent, No. 2198025, BI. No. 4, 02/10/2003. Mamaev A.I., Mamaeva V.A. A method for exciting microplasma discharges at the interface between two liquid phases.
2. RF Patent No. 2281487, BI No. 22, 08/10/2006. Mamaev A.I., Mamaeva V.A., Borikov V.N., Dorofeeva T.I. Automated method for identifying metals and alloys.
3. RF Patent No. 2284517, BI No. 29, 09/27/2006. Mamaev A.I., Mamaeva V.A., Borikov V.N., Dorofeeva T.I., Butyagin P.I. A method for determining the electrical parameters of high-current pulsed processes in solutions and a computer measurement system.
4. RF Patent, RU 2 261 497 C1, BI No. 27, 09/27/2005. Sergeev V.P., Yanovsky V.P., Paraev Yu.N. Extended ion source.
5. RF Patent No. 2280097, 07/20/2006. Kuzmin O.S., Kositsyn L.G., Likhachev V.N. Magnetron sputtering device.

Resources
1. Installation of magnetron application of heat-reflecting coating on architectural glass.
2. Vacuum installation for ion-plasma processing of materials.
3. Laboratory installation for microplasma oxidation.

Areas of contractual activity
- production of magnetron sputtering pulse power devices with a frequency of up to 60 Hz and a discharge power of up to 20 kW for installations with automatic control,
- production of planar magnetrons,
- production of gas-metal ion sources up to 30 kV,
- production of vacuum installations for applying multifunctional coatings by magnetron and arc sputtering methods,
- production of vacuum installations for ion implantation of the surface of materials.